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Sapphire Wafers
Sapphire is widely used in many fields from its excellent characteristics, in particular chemical resistance, thermal conductivity, hardness, transparency. Variously-shaped Nano-step structures can be formed on the Sapphire wafer surface, and have been expected to be used as the height standard sample for SPM and Immobilization plate for observing biomaterials.
Introduction of Technologies
Step Wafers (height: 0.22nm)
Relevant Patent Applications: JPA2007-181007
Advantages
· Long Life
· Low Cost (re-cleanable)
· Useful in various measurement environment
 (High Temperature Resistance, Chemical Resistance)
· Entire Linear Surface in Wide Area
· Step Height Uniformity (0.22nm±0.01nm)
· Extra Smooth Surface Terraces
· Terrace Width is Controllable (100~200nm)

Multi Step Wafers(height; 1.76nm)
Relevant Patent Applications:
JPA006-284316, JPA2007-181007




Bottom Plane of etch pit
Expected Applications
 Height standard sample for SPM
 Immobilization plate for observing biomaterials such as DNA, Protein.
Crystal Structure of Sapphire
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